Structure-property-process parameter correlation in the Advanced MOCVD growth of 4+ μm REBCO thick films over 10+ m

Abstract REBCO (REBa 2 Cu 3 O 7− δ ) coated conductor with J e > 1000 A/mm at operating condition is being utilized in fusion and high-field-magnet applications. We have demonstrated short samples an engineering current density ( ~ 4,600 (based on 0.1 mm thick tape) 4.2 K, 20 T using Advanced Metal-Organic Chemical Vapor Deposition (A-MOCVD). In order to achieve such high performance uniformly over long tapes, defective regions films need be avoided. this work, we investigated parameters that cause dropout or variation the critical along length of tapes made by A-MOCVD. By addressing challenges growing 4+ μm a single pass, 10+ m varies < 5% been fabricated.